dc.rights.license | CC0 | en_US |
dc.contributor.author | Scheen, Gilles | |
dc.contributor.author | Tuyaerts, Romain | |
dc.contributor.author | Nyssens, Lucas | |
dc.contributor.author | Rack, Martin | |
dc.contributor.author | Rasson, J | |
dc.contributor.author | Raskin, JP | |
dc.date.accessioned | 2025-01-23T07:24:21Z | |
dc.date.available | 2025-01-23T07:24:21Z | |
dc.date.issued | 2019-06-02 | |
dc.identifier.uri | https://luck.synhera.be/handle/123456789/2988 | |
dc.description.abstract | Proceedings de IMS 19 | en_US |
dc.description.abstracten | Post-Process Local Porous Silicon Integration Method for RF Application | en_US |
dc.description.sponsorship | REG | en_US |
dc.format.medium | OTH | en_US |
dc.language.iso | NL | en_US |
dc.publisher | HEPL | en_US |
dc.rights.uri | www.hepl.be | en_US |
dc.subject | RF Applications | en_US |
dc.subject | porosification | en_US |
dc.subject | GaN-on-Porous | en_US |
dc.subject.en | Effective dielectric permittivity | en_US |
dc.subject.en | effective resistivity | en_US |
dc.subject.en | harmonic distortion | en_US |
dc.subject.en | RF and microwave losses | en_US |
dc.subject.en | porous silicon | en_US |
dc.subject.en | GaN-on-Silicon | en_US |
dc.title | Post-Process Local Porous Silicon Integration Method for RF Application | en_US |
dc.type | Autre | en_US |
synhera.classification | Ingénierie, informatique & technologie | en_US |
synhera.institution | HE de la Province de Liège | en_US |
synhera.institution | CECOTEPE | en_US |
synhera.otherinstitution | UCLouvain | en_US |
synhera.stakeholders.fund | WIN²WAL | en_US |
dc.rights.holder | HEPL - CECOTEPE | en_US |